Electron-beam mask writing system for 0.25-ヲフm device generation
- 著者名:
Mizuno,K. ( Hitachi,Ltd. ) Kawasaki,K. Itoh,H. Satoh,H. Someda,Y. Saitou,N. - 掲載資料名:
- Photomask and X-Ray Mask Technology III
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2793
- 発行年:
- 1996
- 開始ページ:
- 452
- 終了ページ:
- 463
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- 言語:
- 英語
- 請求記号:
- P63600/2793
- 資料種別:
- 国際会議録
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