New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask

New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask

著者名:

掲載資料名:

Photomask and X-Ray Mask Technology III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2793

発行年:

1996

開始ページ:

359

終了ページ:

370

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421791 [0819421790]

言語:

英語

請求記号:

P63600/2793

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017954
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1996 : 3rd
会議開催地:	Kawasaki City, Kanagawa, Japan
会議開催年:	1996.04.18-1996.04.19

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