Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems
- 著者名:
- Komada,M. ( Dai Nippon Printing Co.,Ltd. )
- Kurihara,M.
- Sasaki,S.
- Makabe,T.
- Hayashi,N.
- 掲載資料名:
- Photomask and X-Ray Mask Technology III
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2793
- 発行年:
- 1996
- 開始ページ:
- 115
- 終了ページ:
- 126
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- 言語:
- 英語
- 請求記号:
- P63600/2793
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |