Thermal Stability of Acceptor-Hydrogen Pairs in Silicon

Thermal Stability of Acceptor-Hydrogen Pairs in Silicon

著者名:

Deicher,M.

掲載資料名:

Proceedings of the 15th International Conference on Defects in Semiconductors : Budapest, Hungary, August 22-26, 1988

シリーズ名:

Materials science forum

シリーズ巻号:

38-41

発行年:

1989

巻:

Part3

開始ページ:

1045

終了ページ:

1050

出版情報:

Aederlmannsdorf, Switzwelns: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878495849 [0878495843]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017895
シリーズID:	PA00000012
会議名:	International Conference on Defects in Semiconduotors : ICDS
回次:	15th
会議開催地:	Budapest, Hungary
会議開催年:	1988.08.22-1988.08.26

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2 国際会議録 *FORMATION OF In-Cu PAIRS IN SILICON DURING CHEMOMECHANICAL POLISHING Wichert, Th., Keller, R., Deicher, M., Pfeiffer, W., Skudlik, H., Steiner, D. Materials Research Society	8 国際会議録 REGROWTH OF DAMAGED LAYERS IN DIAMOND PRODUCED BY ION IMPLANTATION Sandhu, G.S., Liu, B., Parikh, N.R., Hunn, J.D., Swanson, M.L., Wichert, Th., Deicher, M., Skudlik, H., Lennard, W.N., … Materials Research Society
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