Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data

Novel DUV photoresist modeling by optical thin film decomposition from spectral ellipsometry/reflectometry data

著者名:

Niu,X. ( Univ.of California/Berkeley )
Jakatdar,N. ( Univ.of California/Berkeley )
Spanos,C.J. ( Univ.of California/Berkeley )

掲載資料名:

Flatness, roughness, and discrete defects characterization for computer disks, wafers, and flat panel displays II : 29-30 January 1998, San Jose, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3275

発行年:

1998

開始ページ:

172

終了ページ:

179

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427144 [0819427144]

言語:

英語

請求記号:

P63600/3275

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017860
シリーズID:	PA00000029
会議名:	Photonics West : Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays
回次:	1998 : 2nd
会議開催地:	San Jose, CA, USA
会議開催年:	1998.01.29-1998.01.30

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