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ArF excimer laser for 193-nm lithography

著者名:
Stamm,U. ( Lambda Physik GmbH (FRG) )
Patzel,R. ( Lambda Physik GmbH (FRG) )
Kleinschmidt,J. ( Lambda Physik GmbH (FRG) )
Vogler,K. ( Lambda Physik GmbH (FRG) )
Zschocke,W. ( Lambda Physik GmbH (FRG) )
Bragin,I. ( Lambda Physik GmbH (FRG) )
Basting,D. ( Lambda Physik GmbH (FRG) )
さらに 2 件
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
1010
終了ページ:
1013
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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