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Optimal proximity correction: application for flash memory design

著者名:
Chen,Y.G. ( Mosel Vitelic Corp. (Taiwan) )
Huang,D.L. ( Mosel Vitelic Corp. (Taiwan) )
Sung,K.T. ( Mosel Vitelic Corp. (Taiwan) )
Chiang,J.J. ( Mosel Vitelic Corp. (Taiwan) )
Yu,M. ( Mosel Vitelic Corp. (Taiwan) )
Teng,F. ( Mosel Vitelic Corp. (Taiwan) )
Chu,L. ( Technology Modeling Associates,Inc. )
Rey,J.C. ( Technology Modeling Associates,Inc. )
Bernard,D.A. ( Technology Modeling Associates,Inc. )
Li,J. ( Technology Modeling Associates,Inc. )
Moroz,V. ( Technology Modeling Associates,Inc. )
Boksha,V.V. ( Technology Modeling Associates,Inc. )
さらに 7 件
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
874
終了ページ:
884
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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