Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond

Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond

著者名:

Op,de,Beeck,M. ( IMEC (Belgium) )

Vandenberghe,G. ( IMEC (Belgium) )

Jaenen,P. ( IMEC (Belgium) )

Zhang,F.-H. ( IMEC (Belgium) )

Delvaux,C. ( IMEC (Belgium) )

Richardson,P. ( IMEC (Belgium) )

van,Puyenbroeck,I. ( IMEC (Belgium) )

Ronse,K. ( IMEC (Belgium) )

Lamb,III,J.E. ( Brewer Science,Inc. )

van,der,Hilst,J.B.C. ( ASM Japan )

van,Wingerden,J. ( Philips Research Labs. (Netherlands) )

さらに 6 件

掲載資料名:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3334

発行年:

1998

開始ページ:

322

終了ページ:

336

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

言語:

英語

請求記号:

P63600/3334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017855
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1998 : 11th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.25-1998.02.27

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