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Accurate proximity correction method with total-process proximity-based correction factor(TCF)

著者名:
Hashimoto,K. ( Toshiba Corp. (Japan) )
Usui,S. ( Toshiba Corp. (Japan) )
Hasebe,S. ( Toshiba Corp. (Japan) )
Murota,M. ( Toshiba Corp. (Japan) )
Nakayama,T. ( Toshiba Corp. (Japan) )
Matsuoka,F. ( Toshiba Corp. (Japan) )
Inoue,S. ( Toshiba Corp. (Japan) )
Kobayashi,S. ( Toshiba Corp. (Japan) )
Yamamoto,K. ( Toshiba Corp. (Japan) )
さらに 4 件
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
224
終了ページ:
233
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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