0.25-ヲフm logic manufacturability using practical 2D optical proximity correction
- 著者名:
Kling,M.E. ( Motorola ) Lucas,K.D. ( Motorola ) Reich,A. ( Motorola ) Roman,B.J. ( Motorola ) Chuang,H. ( Motorola ) Gilbert,P.V. ( Motorola ) Grobman,W.D. ( Motorola ) Travis,E.O. ( Motorola ) Tsui,P. ( Motorola ) Vuong,T. ( Motorola ) West,J.P. ( Motorola ) - 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 204
- 終了ページ:
- 214
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Optical proximity effects correction at 0.25ヲフm incorporating process variations in lithography
SPIE-The International Society for Optical Engineering |
12
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |