Reduction of mask-induced CD errors by optical proximity correction
- 著者名:
- Randall,J. ( Texas Instruments and IMEC (Belgium) )
- Tritchkov,A. ( IMEC (Belgium) )
- Jonckheere,R. ( IMEC (Belgium) )
- Jaenen,P. ( IMEC (Belgium) )
- Ronse,K. ( IMEC (Belgium) )
- 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 124
- 終了ページ:
- 130
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
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