CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ヲフm gate printing
- 著者名:
Ronse,K. ( IMEC (Belgium) ) Maenhoudt,M. ( IMEC (Belgium) ) Marschner,T. ( IMEC (Belgium) ) Van,den,hove,L. ( IMEC (Belgium) ) Streefkerk,B. ( ASM Lithography BV (Netherlands) ) Finders,J. ( ASM Lithography BV (Netherlands) ) van,Schoot,J. ( ASM Lithography BV (Netherlands) ) Luehrmann,P.F. ( ASM Lithography BV (Netherlands) ) Minvielle,A.M. ( Advanced Micro Devices,Inc. ) - 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 56
- 終了ページ:
- 66
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
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