Blank Cover Image

Parameters affecting megasonic power transmittance in the megasonic cleaning process

著者名:
Kim,Y.H. ( Samsung Electronics Co.,Ltd. (Korea) )
Park,J.H. ( Samsung Electronics Co.,Ltd. (Korea) )
Lee,K.H. ( Samsung Electronics Co.,Ltd. (Korea) )
Choi,S.W. ( Samsung Electronics Co.,Ltd. (Korea) )
Yoon,H.S. ( Samsung Electronics Co.,Ltd. (Korea) )
Sohn,J.M. ( Samsung Electronics Co.,Ltd. (Korea) )
さらに 1 件
掲載資料名:
Photomask and X-Ray Mask Technology V
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3412
発行年:
1998
開始ページ:
455
終了ページ:
462
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
言語:
英語
請求記号:
P63600/3412
資料種別:
国際会議録

類似資料:

1 国際会議録 FIB repair of opaque defects for 64-Mb-DRAM-level binary masks

Lee,K.H., Cho,H.K., Park,J.H., Kim,Y.H., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
7 国際会議録 Characterization Analysis According to Growth Temperature of Carbon Nanowall on Metal Coated Substrate for Electrode Application of Energy Storage

J.K. Park, W.S. Choi, H.S. Hwang, K.H. Lee, J.H. Kim, Y.H. Joung

Trans Tech Publications
2 国際会議録 CD variation sources of photomask

Kim,B.G., Choi,S.W., Yu,Y.H., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
8 国際会議録 Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Choi, Y.-H., Park, J.R., Sung, M.-G., Yang, S.-H., Kim, S.-H., Lee, H.-J., Lee, J.-Y., Jang, I.Y., Kim, Y.H., Choi, …

SPIE-The International Society for Optical Engineering
3 国際会議録 Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM

Park,J.-H., Kim,Y.-H., Lim,S.-C., Lee,K.-H., Choi,S.-W., Yoon,H.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
9 国際会議録 An Analysis on the Forming Load of AA 2024 Aluminum Alloy in Combined and Sequence Operation Process

Hwang, B.B., Shim, J.H., Seo, J.M., Koo, H.S., Ok, J.H., Lee, Y.H., Lee, G.M., Min, K.H., Choi, H.J.

Trans Tech Publications
4 国際会議録 Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems

Kim, Y. -H., Park, J. -H., Lee, K. -H., Choi, S. -W., Yoon, H. -S., Sohn, J. -M.

SPIE - The International Society of Optical Engineering
10 国際会議録 Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Park, J.R., Kim, S.H., Yeo, G.-S., Choi, S.-W., Ki, W.-T., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
5 国際会議録 Mask technology for 0.18-ｦﾌm device generation

Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S.

SPIE-The International Society for Optical Engineering
11 国際会議録 Fogging effect consideration in mask process at 50-KeV e-beam systems

Yang, S.-H., Choi, Y.-H., Park, J.-R., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
6 国際会議録 Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle

Kim,Y.H., Park,J.H., Lee,K.H., Cho,H.K., Yoon,H.S.

SPIE-The International Society for Optical Engineering
12 国際会議録 Improved process control of photomask fabrication in e-beam lithography

Cha,B.-C., Park,J.-H., Choi,Y.-H., Kim,J.-M., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12