Precipitation of oxygen and intrinsic gettering in silicon

Precipitation of oxygen and intrinsic gettering in silicon

著者名:

Tice, W.K. ( IBM General Technology Division )
Tan, T.Y. ( IBM General Technology Division )

掲載資料名:

Defects in semiconductors : proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposia proceedings

シリーズ巻号:

2

発行年:

1981

開始ページ:

367

終了ページ:

380

出版情報:

New York: North Holland

ISSN:

02729172

ISBN:

9780444005960 [044400596X]

言語:

英語

請求記号:

M23500/2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017841
シリーズID:	PA00000010
会議名:	Materials Research Society Annual Meeting ; Symposium on defects in semiconductors
回次:	1980
会議開催地:	Boston, MA, USA
会議開催年:	1980.11.16-1980.11.20

類似資料:

1 国際会議録 Recent Progresses in Understanding Gettering in Silicon Tan, T.Y. Materials Research Society	7 国際会議録 Undissociated dislocations and intermediate defects in As+ ion damaged silicon Foell, H., Tan, T.Y., Krakow, W. North Holland
2 国際会議録 ON THE INTERACTION OF INTRINSIC AND EXTRINSIC GETTERING SCHEMES IN SILICON Yang, K. H., Tan, T. Y. Materials Research Society	8 国際会議録 PRESENT UNDERSTANDING OF PONT DIEECT PARAMETERS AND DIFFUSION IN SILICON: AN OVERVIEW Taylor, W., Gosele, U., Tan, T.Y. Electrochemical Society
3 国際会議録 EXIGENT-ACCOMODATION-VOLUME OF PRECIPITATION AND FORMATION OFOXYGEN PRESIPITATES IN SILICON Tan, T.Y. Materials Research Society	9 国際会議録 ON THE KINETICS OF OXYGEN CLUSTERING AND THERMAL DONOR FORMATION IN CZOCHRALSKI SILICON Tan, T.Y., Kleinhenz R., Schneider C.P. Materials Research Society
4 国際会議録 The Influence of Carbon on the Effective Diffusivities of Intrinsic Point Defects in Silicon Goesele, U., Ploessl, A., Tan, T.Y. Electrochemical Society	10 国際会議録 Detection of point defect chains in ion irradiated silicon by high resolution electron microscopy Krakow, W., Tan, T.Y., Foell, H. North Holland
5 国際会議録 INVITED: SCIENCE AND MODELING OF IMPURITY GETTERING IN SILICON Tan, T.Y., Gafiteanu, R., Joshi, S.M., Goesele, U.M. Electrochemical Society	11 国際会議録 Dislocation nucleation models from point defect condensations in silicon and germanium Tan, T.Y. North Holland
6 国際会議録 Oxygen Precipitation Behavior and its Optimum Condition for Internal Gettering and Mechanical Strength in Epitaxial and Polished Silicon Wafers Sueoka,K., Akatsuka,M., Onno,T., Asayama,E., Koike,Y., Adachi,N., Sadamitsu,S., Katahama,H. Electrochemical Society, SPIE-The International Society for Optical Engineering	12 国際会議録 ON THE QUESTION OF OXYGEN DIFFUSION DURING OXYGEN RELATED THERMAL DONOR FORMATION IN SILICON Oehrlein, G.S., Tan, T.Y., Kleinhenz, R.L., Lindstrom, J.L. Materials Research Society

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