Advanced rf CMOS technology
- 著者名:
Iwai,H. ( Tokyo Institute of Technology ) Ohguro,T. Morifuji,E. Yoshitomi,T. Kimijima,H. Momose,H.S. Inoh,K. Nii,H. Katsumata,Y. - 掲載資料名:
- Design, characterization, and packaging for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3893
- 発行年:
- 1999
- 開始ページ:
- 10
- 終了ページ:
- 19
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434944 [0819434949]
- 言語:
- 英語
- 請求記号:
- P63600/3893
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
8
国際会議録
Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |