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Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

著者名:
Fukuhara,N. ( Toppan Printing Co.Ltd. )
Haraguchi,T.
Kanayama,K.
Matsuo,T.
Takeuchi,S.
Tomiyama,K.
Saga,T.
Hattori,Y.
Ooshima,T.
Otaki,M.
さらに 5 件
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part2
開始ページ:
979
終了ページ:
986
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

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