TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

著者名:

Koo,S.-S. ( Hyundai Electronics Industries Co.Ltd. )

掲載資料名:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3873

発行年:

1999

巻:

Part2

開始ページ:

969

終了ページ:

978

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

言語:

英語

請求記号:

P63600/3873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017632
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology
回次:	1999 : 19th
会議開催地:	Monterey, California, USA
会議開催年:	1999.09.15-1999.09.17

類似資料:

1 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	7 国際会議録 Study of optical proximity effects using off-axis illumination with attenuated phase shift mask C.-N. Ahn, K.-H. Baik, Y.-S. Lee, H.-E. Kim, I.-B. Hur Society of Photo-optical Instrumentation Engineers
2 国際会議録 Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	8 国際会議録 Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering
3 国際会議録 Comparison study of mask error effects for various mask-making processes Eom,T.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,D.Y., Shin,C. SPIE - The International Society for Optical Engineering	9 国際会議録 Application of attenuated phase-shifting masks to sub-130-nm lithography Koo,C.-K., Choo,L.-C., Lin,Q., Tan,S.-S., Lee,H.-J., Tam,S.-C., See,A. SPIE-The International Society for Optical Engineering
4 国際会議録 Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering	10 国際会議録 TiSi-nitride attenuating phase-shift photomask for 193-nm lithography Reynolds,G.A.M., French,R.H., Carcia,P.F., Torardi,C.C., Hughes,G.P., Jones,D.J., Lemon,M.F., Reilly,M., Wilson,L., … SPIE - The International Society for Optical Engineering
5 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H. SPIE-The International Society for Optical Engineering	11 国際会議録 Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography Nam,K.-H., Kim,L.-J., Jeong,H.-S., Lee,S.-W., Lee,I.-S., Shin,C., Kim,H.-S., Dieu,L., Paek,S.W., Koo,S.-S., Bae,S.-M., … SPIE-The International Society for Optical Engineering
6 国際会議録 Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	12 国際会議録 Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography Chang, C.H., Schacht, J., Lin, B.S.-M, Hung, K.C., Huang, I.H. SPIE - The International Society of Optical Engineering

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