Simulation study and fabrication of high-transmittance attenuated phase-shifting mask

Simulation study and fabrication of high-transmittance attenuated phase-shifting mask

著者名:

Kim,E. ( Korea Advanced Institute of Science and Technology )

掲載資料名:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3873

発行年:

1999

巻:

Part2

開始ページ:

928

終了ページ:

936

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

言語:

英語

請求記号:

P63600/3873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017632
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology
回次:	1999 : 19th
会議開催地:	Monterey, California, USA
会議開催年:	1999.09.15-1999.09.17

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1 国際会議録 Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T. SPIE-The International Society for Optical Engineering	7 国際会議録 Study of optical proximity effects using off-axis illumination with attenuated phase shift mask C.-N. Ahn, K.-H. Baik, Y.-S. Lee, H.-E. Kim, I.-B. Hur Society of Photo-optical Instrumentation Engineers
2 国際会議録 High transmittance attenuated phase shifting mask of chromium aluminum oxynitride Choi,E., Kim,E., Kim,H., Kim,Y., Tian,H., No,K. SPIE-The International Society for Optical Engineering	8 国際会議録 High-transmittance rim-type attenuated phase-shift masks for sub-0.2-ｦﾌm hole patterns Iwasaki,H., Hoshi,K., Tanabe,H. SPIE-The International Society for Optical Engineering
3 国際会議録 Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering	9 国際会議録 Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
4 国際会議録 Fabricating 100-nm line patterns with high-transmittance ArF attenuated phase-shift masks Iwasaki,H., Ishida,S., Tonai,K., Nozue,H. SPIE-The International Society for Optical Engineering	10 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering
5 国際会議録 Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems Kim, Y. -H., Park, J. -H., Lee, K. -H., Choi, S. -W., Yoon, H. -S., Sohn, J. -M. SPIE - The International Society of Optical Engineering	11 国際会議録 Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity Sugawara,M., Ishikawa,K., Kawahira,H., Kagami,I., Nozawa,S. SPIE-The International Society for Optical Engineering
6 国際会議録 New structure of ArF high-transmittance attenuated phase-shifting mask with dry etching process Iso, H., Harashima, N., Isozaki, T., Kanai, S., Sasaki, T. SPIE - The International Society of Optical Engineering	12 国際会議録 Defect inspection and printability of deep-UV halftone phase-shifting mask Kim,H.-J., Hong,J.-S., Kye,J.-W., Cha,D.-H., Kang,H.-Y., Moon,J.-T. SPIE-The International Society for Optical Engineering

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