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Next-generation lithography mask development at the NGL Mask Center of Competency

著者名:
Lercel,M.J. ( IBM Microelectronics Div. )
Brooks,C.J.
Racette,K.C.
Magg,C.
Lawliss,M.
Caldwell,N.
Jeffer,R.
Collins,K.W.
Barrett,M.
Nash,S.C.
Trybendis,M.J.
Bouchard,L.
さらに 7 件
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part2
開始ページ:
804
終了ページ:
813
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

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1 国際会議録 Next-generation lithography mask development at the NGL-MCOC

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2 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

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9 国際会議録 EUVL mask fabrication for the 45-nm node

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