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Comparison study of mask error effects for various mask-making processes

著者名:
Eom,T.-S. ( Hyundai Electronics Industries Co.Ltd. )
Hur,I.-B.
Koo,Y.-M.
Baik,K.-H.
Choi,I.-H.
Kim,D.Y.
Shin,C.
さらに 2 件
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part2
開始ページ:
734
終了ページ:
745
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

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