ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography

ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography

著者名:

Onodera,T. ( Semiconductor Leading Edge Technologies,Inc. )

掲載資料名:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3873

発行年:

1999

巻:

Part1

開始ページ:

337

終了ページ:

343

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

言語:

英語

請求記号:

P63600/3873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017632
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology
回次:	1999 : 19th
会議開催地:	Monterey, California, USA
会議開催年:	1999.09.15-1999.09.17

類似資料:

1 国際会議録 Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography Fukuhara,N., Haraguchi,T., Kanayama,K., Matsuo,T., Takeuchi,S., Tomiyama,K., Saga,T., Hattori,Y., Ooshima,T., Otaki,M. SPIE - The International Society for Optical Engineering	7 国際会議録 Process margin in ArF lithography using an alternating phase-shifting mask Matsuo,T., Nakazawa,K., Ogawa,T. SPIE - The International Society for Optical Engineering
2 国際会議録 CrOxFy as a material for attenuated phase-shift masks in ArF lithography Nakazawa,K., Matsuo,T., Onodera,T., Morimoto,H., Mohri,H., Hatsuta,C., Hayashi,N. SPIE - The International Society for Optical Engineering	8 国際会議録 Feasibility study of an embedded transparent phase-shifting mask in ArF lithography Matsuo,T., Ogawa,T., Morimoto,H. SPIE - The International Society for Optical Engineering
3 国際会議録 Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering	9 国際会議録 Challenge to sub-0.1-ｦﾌm pattern fabrication using an alternating phase-shifting mask in ArF lithography Matsuo,T., Nakazawa,K., Ogawa,T. SPIE - The International Society for Optical Engineering
4 国際会議録 Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering	10 国際会議録 ZrSiON as a material for high-transmittance attenuated PSM Kanayama,K., Haraguchi,T., Yamazaki,T., Ii,T., Matsuo,T., Fukuhara,N., Saga,T., Hattori,Y., Ooshima,T., Otaki,M. SPIE-The International Society for Optical Engineering
5 国際会議録 Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography Ii,T., Saga,T., Hattori,Y., Ohshima,T., Otaki,M., Iwakata,M., Haraguchi,T., Kanayama,K., Yamazaki,T., Fukuhara,N., … SPIE-The International Society for Optical Engineering	11 国際会議録 Zr-based films for attenuated phase-shift mask Matsuo,T., Ohkubo,K., Haraguchi,T., Ueyama,K. SPIE-The International Society for Optical Engineering
6 国際会議録 Investigation of attenuated phase-shifting mask material for 157-nm lithography Onodera,T., Matsuo,T., Itani,T., Morimoto,H. SPIE-The International Society for Optical Engineering	12 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12