Development of simplified process for KrF excimer halftone mask with chrome-shielding method

Development of simplified process for KrF excimer halftone mask with chrome-shielding method

著者名:

Kobayashi,S. ( Sharp Corp. )

掲載資料名:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3873

発行年:

1999

巻:

Part1

開始ページ:

288

終了ページ:

296

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

言語:

英語

請求記号:

P63600/3873

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017632
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology
回次:	1999 : 19th
会議開催地:	Monterey, California, USA
会議開催年:	1999.09.15-1999.09.17

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