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Extension of graybeam writing for the 130-nm technology node

著者名:
Chabala,J.M. ( Etec Systems,Inc )
Abboud,F.E.
Sauer,C.A.
Weaver,S.
Lu,M.
Pearce-Percy,H.T.
Hofmann,U.
Vernon,M.
Ton,D.
Cole,D.M.
Naber,R.J.
さらに 6 件
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part1
開始ページ:
36
終了ページ:
48
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

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