Lattice strain in excimer-laser-crystallized poly-Si thin films
- 著者名:
- Okumura,H. ( NEC Corp. )
- Tanikawa,A.
- Sera,K.
- Okumura,F.
- 掲載資料名:
- Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3618
- 発行年:
- 1999
- 開始ページ:
- 320
- 終了ページ:
- 327
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430885 [0819430889]
- 言語:
- 英語
- 請求記号:
- P63600/3618
- 資料種別:
- 国際会議録
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11
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Melting and Resolidification Dynamics of a-Si and Poly-Si Thin Films During Excimer Laser Annealing
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