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Next-generation lithography mask development at the NGL-MCOC

著者名:
Lercel,M.J. ( Photronics Inc.(USA)and IBM Microelectronics Div. )
Racette,K.C.
Magg,C.
Lawliss,M.
Collins,K.W.
Barrett,M.
Trybendis,M.J.
Bouchard,L.
さらに 3 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology VII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4066
発行年:
2000
開始ページ:
105
終了ページ:
115
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
言語:
英語
請求記号:
P63600/4066
資料種別:
国際会議録

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