Major improvements in mask CD metrology:enhanced performance on attenuated phase-shift masks,corner rounding measurements,and improved measurement automation
- 著者名:
Schluter,G. ( Leica Microsystems Wetzlar GmbH ) Scheuring,G. Falk,G. Bruck,H.-J. Schatz,T. Lehnigk,S. - 掲載資料名:
- 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3996
- 発行年:
- 2000
- 開始ページ:
- 134
- 終了ページ:
- 138
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436146 [0819436143]
- 言語:
- 英語
- 請求記号:
- P63600/3996
- 資料種別:
- 国際会議録
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