Major improvements in mask CD metrology:enhanced performance on attenuated phase-shift masks,corner rounding measurements,and improved measurement automation

Major improvements in mask CD metrology:enhanced performance on attenuated phase-shift masks,corner rounding measurements,and improved measurement automation

著者名:

Schluter,G. ( Leica Microsystems Wetzlar GmbH )

掲載資料名:

16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3996

発行年:

2000

開始ページ:

134

終了ページ:

138

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436146 [0819436143]

言語:

英語

請求記号:

P63600/3996

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017587
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	1999 : 16th
会議開催地:	Munich, Germany
会議開催年:	1999.11.15-1999.11.16

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