Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond
- 著者名:
- Peter,K. ( aiss GmbH )
- Ordynskyy,V.
- Dolainsky,C.
- Hartmann,H.
- Bruck,H.-J.
- 掲載資料名:
- 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3996
- 発行年:
- 2000
- 開始ページ:
- 120
- 終了ページ:
- 122
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436146 [0819436143]
- 言語:
- 英語
- 請求記号:
- P63600/3996
- 資料種別:
- 国際会議録
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3
国際会議録
Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |