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Growth and Stress Characterization of LPCVD SiC Films Deposited on Bare, Carbonized and Oxidized Si(001) Substrates

著者名:
掲載資料名:
Properties and processing of vapor-deposited coatings : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
555
発行年:
1999
開始ページ:
173
出版情報:
Warrendale, PA.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994614 [1558994610]
言語:
英語
請求記号:
M23500/555
資料種別:
国際会議録

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