Blank Cover Image

High-Temperature Stability of Amorphous Al2O3 Deposited on Si and CeO2-Stabilized ZrO2 by Metalorganic Chemical Vapor Deposition

著者名:
掲載資料名:
Properties and processing of vapor-deposited coatings : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
555
発行年:
1999
開始ページ:
103
出版情報:
Warrendale, PA.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994614 [1558994610]
言語:
英語
請求記号:
M23500/555
資料種別:
国際会議録

類似資料:

1 国際会議録 Structural Study of In2O3 Structures Grown by the Metalorganic Chemical Vapor Deposition

Kim, H.W., Myung, J.H., Lee, C.M.

Trans Tech Publications
7 国際会議録 Properties of InGaN/GaN Quantum Wells Grown by Metalorganic Chemical Vapor Deposition

Cheong, M.G., Kim, K.S., Kim, C.S., Choi, R.J., Yoon, H.S., Yu, S.W., Hong, Y.K., Hong, C.-H., Suh, E.-K., Lee, H.J.

Materials Research Society
2 国際会議録 Characterization of a Solid-Source Delivery System for Metalorganic Chemical Vapor Deposition by In Situ Laser Reflectance

Dubourdieu, C., Kim, G. Y., Meyer, J. D., Gallois, B.

MRS - Materials Research Society
8 国際会議録 METALORGANIC CHEMICAL VAPOR DEPOSITION OF InP BY PULSING PRECURSORS

Chen, W.K., Chen, J.C., Anthony, L., Liu, P.L.

Materials Research Society
3 国際会議録 The Growth of InGaAsN for High-Efficiency Solar Cells by Metalorganic Chemical Vapor Deposition

Allerman, A.A., Kurtz, S.R., Jones, E.D., Gee, J.M., Banks, J.C., Climent-font, A.

Electrochemical Society
9 国際会議録 LOW TEMPERATURE GROWTH OF SUPERCONDUCTING YBa2Cu3O7-x THIN FILMS BY METALORGANIC CHEMICAL VAPOR DEPOSITION

Kanehori, Keiichi, Sugii, Nobuyuki, Miyauchi, Katsuki

Materials Research Society
4 国際会議録 PREPARATION OF Ba1-xSrxTiO3 THIN FILMS BY METALORGANIC CHEMICAL VAPOR DEPOSITION AND THEIR PROPERTIES

Gilbert, S. R., Wessels, B. W., Neumayer, D. A., Marks, T. J., Schindler, J. L., Kannewurf, C. R.

MRS - Materials Research Society
10 国際会議録 DEPOSITION AND CHARACTERIZATION OF METALORGANIC CHEMICAL VAPOR DEPOSITION ZrO2 THIN FILMS USING Zr(thd)4

Si, Jie, Peng, Chien H., Desu, Seshu B.

Materials Research Society
5 国際会議録 High Temperature Stability of Bulk Ti3SiC2 Materials in Air

D.H. Lee, J.H. Han, Y.D. Kim, S.W. Park, D.B. Lee

Trans Tech Publications
11 国際会議録 TEMPERATURE DEPENDENCE OF CARBON INCORPORATION IN AlxGa1-xAs GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

Forbes, D. V., Coleman, J. J.

MRS - Materials Research Society
6 国際会議録 Characteristics of ZrO2/Al2O3 Bilayer Film for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method

Kim, Y.D., Lee, J.H., Koo, J.H, Chang, H.J., Jeon, H.T.

Trans Tech Publications
12 国際会議録 IN SITU HETEROEPITAXIAL Bi2Sr2CaCu2O8 THIN FILMS PREPARED BY METALORGANIC CHEMICAL VAPOR DEPOSITION

DiMeo, Frank, Jr., Wessels, Bruce W., Neumayer, Deborah A., Marks, Tobin J., Schindler, Jon L., Kannewurf, Carl R.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12