Stability of Silicon-Oxygen-Fluorine and Carbon-Fluorine Low-K Dielectrics with Respect to Attack by Water
- 著者名:
- 掲載資料名:
- Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 511
- 発行年:
- 1998
- 開始ページ:
- 371
- 出版情報:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994171 [1558994173]
- 言語:
- 英語
- 請求記号:
- M23500/511
- 資料種別:
- 国際会議録
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5
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Bonded Hydrogen Atom Participation in Metastable Defect Formation in Hydrogenated Amorphous Silicon
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