Chlorine-Based Plasma Etching of GaN | 東京工業大学附属図書館文献データベース

Blank Cover Image

Chlorine-Based Plasma Etching of GaN

著者名:

Abernathy, C. R.

Constantine, C.

さらに 3 件

掲載資料名:

III-V nitrides : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

449

発行年:

1997

開始ページ:

969

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993532 [1558993533]

言語:

英語

請求記号:

M23500/449

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017523
シリーズID:	PA00000011
会議名:	Symposium on III-V nitrides
回次:	1996
会議開催地:	Boston, MA, USA
会議開催年:	1996.12.02-1996.12.06

類似資料:

1 国際会議録 Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source Constantine, C., Johnson, D., Barratt, C., Shul, R. J., McClellan, G. B., Briggs, R. D., Rieger, D. J., Karlicek, R. F., … MRS - Materials Research Society	7 国際会議録 ECR, ICP and RIE plasma etching of GaN Shul, R.J., McClellan, G.B., Rieger, D.J., Hafich, M.J., Drummond, T.J., Pearton, S.J., Abernathy, C.R., Constantine, … Electrochemical Society
2 国際会議録 ICP Dry Etching of III-V Nitrides Vartuli, C. B., Lee, J. W., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J., … MRS - Materials Research Society	8 国際会議録 Comparison of ICI and Ibr for Dry Etching of III-Nitrides Vartuli, C. B., Lee, J. W., MacKenzie, J. D., Pearton, S. J., Abernathy, C. R., Shul, R. J. MRS - Materials Research Society
3 国際会議録 Plasma Chemistries for Dry Etching GaN, AlN, InGaN and InAlN Pearton, S. J., Vartuli, C. B., Lee, J. W., Donovan, S. M., MacKenzie, J. D., Abernathy, C. R., Shul, R. J., McLane, G. … MRS - Materials Research Society	9 国際会議録 Cl2-Based Dry Etching of the AlGalnN System in Inductively-Coupled Plasmas Cho, Hyun, Vartuli, C. B., Abernathy, C. R., Donovan, S. M., Pearton, S. J., Shul, R. J., Han, J. MRS - Materials Research Society
4 国際会議録 Plasma-Induced-Damage of GaN Shul, R.J., Zolper, J.C., Hagerott Crawford, M., Hickamn, R.J., Briggs, R.D., Pearton, S.J., Lee, J.W., Karlicek, R.F., … Electrochemical Society	10 国際会議録 Chemical Etching of AlN and InAlN in KOH Solutions Vartuli, C. B., Lee, J. W., MacKenzie, J. D., Pearton, S. J., Abernathy, C. R., Zolper, J. C., Shul, R. J., Ren, F. MRS - Materials Research Society
5 国際会議録 Patterning of GaN in High-Density Cl2- and BCl3-Based Plasmas Shul, R. J., Briggs, R. D., Han, J., Pearton, S. J., Lee, J. W., Vartuli, C. B., Killeen, K. P., Ludowise, M. J. MRS - Materials Research Society	11 国際会議録 High Rate Dry Etching of GaN, AIN and InN in ECR Cl2/CH4/H2/Ar Plasmas Vartuli, C. B., Pearton, S. J., Abernathy, C. R., Shul, R. J., Kilcoyne, S. P., Crawford, M. Hagerott, Howard, A. J., … MRS - Materials Research Society
6 国際会議録 Plasma Chemistry Dependent ECR Etching of GaN Shul, R. J., Ashby, C. I. H., Rieger, D. J., Howard, A. J., Pearton, S. J., Abernathy, C. R., Vartuli, C. B., Barnes, P. … MRS - Materials Research Society	12 国際会議録 Comparison of Novel Chlorine, Bromine, and Iodine Plasma Chemistries for Anisotropic Trench Etching in GaN, InN, and AIN Cho, Hyun, Maeda, T., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J., Han, J., Ren, F. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12