Electrical Resistivity of Copper Films by Partially Ionized Beam Deposition

Electrical Resistivity of Copper Films by Partially Ionized Beam Deposition

著者名:

Han, S.

掲載資料名:

Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

438

発行年:

1997

開始ページ:

381

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993426 [1558993428]

言語:

英語

請求記号:

M23500/438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017522
シリーズID:	PA00000011
会議名:	Symposium on materials modification and synthesis by ion beam processing
回次:	1996
会議開催地:	Boston, MA, USA
会議開催年:	1996.12.02-1996.12.05

類似資料:

1 国際会議録 Electrical Resistivity of Copper Films by Partially Ionized Beam Deposition Han, S., Yoon, K. H., Kim, K. H., Jang, H. G., Choi, S. C., Jung, H-J., Koh, S. K. MRS - Materials Research Society	7 国際会議録 Preparation and Characterization of Tin Oxide Films by Ion-Assisted Deposition Choi, W-K., Cho, J-S., Song, S. K., Kim, Y. T., Yoon, K. H., Jung, H-J., Koh, S-K. MRS - Materials Research Society
2 国際会議録 Thermal Stability of Cu Films on TiN/Ti/Si(100) by Partially Ionized Beam Deposition Jang, H. G., Kim, K. H., Choi, D. J., Han, S., Choi, S. C., Choi, W-K., Jung, H-J., Koh, S-K. MRS - Materials Research Society	8 国際会議録 XPS AND FTIR STUDY OF THE THIN POLYIMIDE FILMS FABRICATED BY IONIZED CLUSTER BEAM DEPOSITION Kim, K. W., Chae, K. H., Choi, S. C., Cho, S. J., Vahe, Y. W., Whang, C. N., Jung, H. J., Lee, D. H., Lee, J. K. Materials Research Society
3 国際会議録 Thermal Stability of Cu Films on TiN/Ti/Si(100) by Partially Ionized Beam Deposition Jang, H. G., Kim, K. H., Choi, D. J., Han, S., Choi, S. C., Choi, W. K., Jung, H-J., Koh, S. K. MRS - Materials Research Society	9 国際会議録 Novel 193-nm single-layer resist containing a multifunctional monomer Lee, G., Koh, C. -W., Jung, J. -C., Jung, M. -H., Kim, H. -S., Baik, K. -H., Choi, I. -H. SPIE - The International Society of Optical Engineering
4 国際会議録 Cu Films on Si(100) by Partially Ionized Beam Deposition Koh, Seok-Keun, Kim, Ki-Hwan, Han, Sung, Jang, Hong Gui, Jung, Hyung-Jin MRS - Materials Research Society	10 国際会議録 CRYSTALLINE POLYIMIDE THIN FILM DEPOSITION BY IONIZED CLUSTER BEAM Cho, S.J., Choe, H.S., Jang, H.G., Kim, S.S., Whang, C.N. Materials Research Society
5 国際会議録 Deposition of Cu Films for Laser Mirror by Partially Ionized Beam Deposition Koh, Seok-Keun, Yoon, Young-Soo, Kim, Ki-Hwan, Jang, Hong-Gui, Jung, Hyung-Jin MRS - Materials Research Society	11 国際会議録 ELECTRICAL PROPERTIES OF THIN POLYIMIDE FILMS PREPARED BY IONIZED CLUSTER BEAM DEPOSITION Jung, H-J., Lee, D-H., Lee, J-K, Whang, C-N. Materials Research Society
6 国際会議録 Controls of Crystallinity and Surface Roughness of Cu Film in Partially lonized Beam Deposition Koh, Seok-Keun, Kim, Ki-Hwan, Choi, Won-Kook, Jang, Hong-Gui, Yoon, Young-Soo, Han, Sung, Jung, Hyung-Jin MRS - Materials Research Society	12 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering

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