Charge State Defect Engineering of Silicon During Ion Implantation

Charge State Defect Engineering of Silicon During Ion Implantation

著者名:

掲載資料名:

Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

438

発行年:

1997

開始ページ:

39

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993426 [1558993428]

言語:

英語

請求記号:

M23500/438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017522
シリーズID:	PA00000011
会議名:	Symposium on materials modification and synthesis by ion beam processing
回次:	1996
会議開催地:	Boston, MA, USA
会議開催年:	1996.12.02-1996.12.05

類似資料:

1 国際会議録 Charge-State Defect Engineering of Silicon During Ion Implantation Brown, R. A., Ravi, J., Erokhin, Y., Rozgonyi, G. A., White, C. W. MRS - Materials Research Society	7 国際会議録 In Situ Deep Level Transient Spectroscopy of Defect Evolution in Silicon Following Ion Implantation at 80 K Cho, C. R., Brown, R. A., Kononchuk, O., Yarykin, N., Rozgonyi, G., Zuhr, R. MRS - Materials Research Society
2 国際会議録 SUPPRESSION OF SELF-INTERSTITIALS IN SILICON DURING ION IMPLANTATION VIA IN-SITU PHOTOEXCITATION Ravi, J., Erokhin, Yu., Christensen, K., Rozgonyi, G. A., Patnaik, B. K., White, C. W. MRS - Materials Research Society	8 国際会議録 In Situ Photoexcitation-Induced Suppression of Point Defect Generation in Ion Implanted Silicon Cho, C. R., Yarykin, N., Rozgonyi, G. A., Zuhr, R. A. MRS - Materials Research Society
3 国際会議録 THE INFLUENCE OF AN IN-SITU ELECTRIC FIELD ON H+ AND He+ IMPLANTATION INDUCED DEFECTS IN SILICON Ravi, J., Erokhin, Yu., Koveshnikov, S., Rozgonyi, G. A., White, C. W. MRS - Materials Research Society	9 国際会議録 EFFECTS OF CONCURRENT Co OR Ti SILICIDATION ON TRANSIENT DIFFUSION AND END-OF-RANGE DAMAGE IN PHOSPHORUS IMPLANTED SILICON Honeycutt, J. W., Ravi, J., Rozgonyi, G. A. Materials Research Society
4 国際会議録 THIN Ni SILICIDE FORMATION BY LOW TEMPERATURE-INDUCED METAL ATOM REACTION WITH ION IMPLANTED AMORPHOUS SILICON Erokhin, Yu.N., Patnaik, B.K., Pramanick, S., Hong, F., White, C.W., Rozgonyi, G.A. Materials Research Society	10 国際会議録 The charge state of iron implanted into sapphire McHargue J. C., Sklad S. P., White W. C., Farlow C. G., Perez A., Kornilios N., Marest G. Kluwer Academic Publishers
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6 国際会議録 THE CHARGE STATE OF IRON IONS IMPLANTED INTO SAPPHIRE McHargue, C. J., Sklad, P. S., White, C. W., Farlow, G. C., Perez, A., Kornilios, N., Marest, G. Materials Research Society	12 国際会議録 Secondary Defect Formation and Gettering in MeV Self-Implanted Silicon Brown, R. A., Kononchuk, O., Radzimski, Z., Rozgonyi, G. A., Gonzalez, F. MRS - Materials Research Society

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