Isothermal Stress Relaxation in Al, AlCu and AlVPd Films
- 著者名:
- 掲載資料名:
- Materials reliability in microelectronics VI : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 428
- 発行年:
- 1996
- 開始ページ:
- 513
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993310 [1558993312]
- 言語:
- 英語
- 請求記号:
- M23500/428
- 資料種別:
- 国際会議録
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5
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EVOLUTION OF STRESS DURING FORMATION OF TITANIUM DISILICIDE BY RTA AND TUBE FURNACE ANNEALING
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