Quality assurance of dielectric masks for laser ablation technology
- 著者名:
- Pulaski,D. ( IBM Microelectronics )
- Patel,R.S.
- Speidell,J.L.
- 掲載資料名:
- 15th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2621
- 発行年:
- 1995
- 開始ページ:
- 374
- 終了ページ:
- 385
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819419859 [0819419850]
- 言語:
- 英語
- 請求記号:
- P63600/2621
- 資料種別:
- 国際会議録
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