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Thermal stability of PECVD W-B-N thin film as a diffusion barrier

著者名:
  • Kim,Y.T. ( Korea Institute of Science and Technology )
  • Kim,D.J. ( Korea Institute of Science and Technology and Hanyang Univ.(Korea) )
  • Lee,C.W. ( Kookmin Univ.(Korea) )
  • Park,J.-W. ( Hanyang Univ.(Korea) )
掲載資料名:
Multilevel Interconnect Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3214
発行年:
1997
開始ページ:
48
終了ページ:
56
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425461 [081942546X]
言語:
英語
請求記号:
P63600/3214
資料種別:
国際会議録

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