Silicon epitaxy and oxidation
- 著者名:
Meindl D. J. Dutton W. R. Saraswat C. K. Plummer D. J. Kamins I. T. Deal E. B. - 掲載資料名:
- Process and device modeling for integrated circuit design : [proceedings of the NATO Advanced Study Institute on Process and device modeling for integrated circuit design, Louvain-la-Neuve, Belgium, July 19-29, 1977]
- シリーズ名:
- NATO ASI series. Series E, Applied sciences
- シリーズ巻号:
- 21
- 発行年:
- 1977
- 開始ページ:
- 57
- 終了ページ:
- 113
- 総ページ数:
- 57
- 出版情報:
- Leyden: Noordhoff International Publishing
- ISSN:
- 0168132X
- ISBN:
- 9789028606678 [902860667X]
- 言語:
- 英語
- 請求記号:
- N11482/21
- 資料種別:
- 国際会議録
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