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New optical sensor for real-time in-situ endpoint monitoring during dry etching of III-V ternary multistack layers

著者名:
Liddane,K.J. ( Instruments SA,Inc )
Benferhat,R.
Lee,J.
Westerman,R.
Johnson,D.J.
Donohue,J.F.
Sasserath,J.N.
Pearton,S.J.
さらに 3 件
掲載資料名:
Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3882
発行年:
1999
開始ページ:
300
終了ページ:
308
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434791 [0819434795]
言語:
英語
請求記号:
P63600/3882
資料種別:
国際会議録

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