IC yield enhancement through optimization of photolithography pattern at the isolation step

IC yield enhancement through optimization of photolithography pattern at the isolation step

著者名:

Nagel,K. ( Motorola,Inc )
Spivey,S.
Wang,P.

掲載資料名:

Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3882

発行年:

1999

開始ページ:

292

終了ページ:

299

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434791 [0819434795]

言語:

英語

請求記号:

P63600/3882

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017165
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Process, Equipment, and Materials Control in Intregrated Circuit Manufacturing
回次:	1999 : 5th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.09.22-1999.09.23

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