Extending ellipsometry capabilities for ultrathin gate oxide metrology using rapid optical surface treatment technology
- 著者名:
- Tardif,F. ( CEA/LETI )
- Danel,A.
- Kamieniecki,E.
- Harrington,J.
- 掲載資料名:
- Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3882
- 発行年:
- 1999
- 開始ページ:
- 126
- 終了ページ:
- 131
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434791 [0819434795]
- 言語:
- 英語
- 請求記号:
- P63600/3882
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
8
国際会議録
COPPER LOW-k CONTAMINANTION AND POST ETCH RESIDUES REMOVAL USING SUPERCRITICAL C02-BASED PROCESSES
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
9
国際会議録
Detection of noble metals in HF based chemistries by microwave photoconductive decay (μ-PCD)
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |