Blank Cover Image

Mainstreaming SOI CMOS technology

著者名:
Shahidi,C.G. ( IBM Microelectronics Div. )  
掲載資料名:
Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3882
発行年:
1999
開始ページ:
15
終了ページ:
23
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434791 [0819434795]
言語:
英語
請求記号:
P63600/3882
資料種別:
国際会議録

類似資料:

1 国際会議録 Mainstreaming SOI CMOS technology

Shahidi,G.G.

SPIE - The International Society for Optical Engineering
7 国際会議録 Merged CCD/SOI-CMOS technology

Suntharalingam,V., Burke,B.E., Burns,J.A., Cooper,M.J., Keast,C.L.

SPIE - The International Society for Optical Engineering
2 国際会議録 Mainstreaming SOI CMOS technology

Shahidi,G.G.

SPIE - The International Society for Optical Engineering
8 国際会議録 Is SOI CMOS a promising technology for SOCs in high frequency range? Invited

Raynaud, C., Gianesello, F., Tinella, C., Flatresse, P., Gwoziecki, R., Touret, P., Avenier, G., Haendler, S., Gonnard, …

Electrochemical Society
3 国際会議録 Mainstreaming SOI CMOS technology

Shahidi,G.G.

SPIE - The International Society for Optical Engineering
9 国際会議録 Parasitic bipolar effect in modern SOI CMOS technologies

V. E. Shunkov, M. S. Gorbunov, G. I. Zebrev, B. V. Vasilegin

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Mainstreaming SOI Technology for High Performance CMOS

Shahidi, G.G.

Electrochemical Society
10 国際会議録 Device/Circuit modeling and simulation applied to design of Deep-Submicron SOI CMOS technology

Fossum, J.G., Yeh, P.C., Suh, D., Krishnan, S.

Electrochemical Society
5 国際会議録 SOI materials for mainstream CMOS technology

Maszara, W.P., Dockerty, R., Gondran, C., Vasudev, P.K.

Electrochemical Society
11 国際会議録 High performance SOI technology for sub-45nm gate length CMOS manufacturing Invited

Horstmann, M., Greenlaw, D., Huebler, P., Stephan, R., Feudel, Th., Wei, A., Frohberg, K., Hoentschel, J., Javorka, P., …

Electrochemical Society
6 国際会議録 High Performance CMOS on SOI

Yang, I.Y., Fung, S., Sleight, J., Narasimha, S., Zamdmer, N., Smeys, P., Welser, J., Agnello, P., Leobandung, E., …

Electrochemical Society
12 国際会議録 Review of the technology for the manufacturing of large-format DCG holograms for technical applications

Stojanoff,C.G.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12