Stability and Oxidation Behavior of Ir Thin Film Electrodes on Si and SiO2

Stability and Oxidation Behavior of Ir Thin Film Electrodes on Si and SiO2

著者名:

Saenger, K. L.

掲載資料名:

Ferroelectric thin films VII : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

541

発行年:

1999

開始ページ:

119

出版情報:

Warrendale, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994478 [1558994475]

言語:

英語

請求記号:

M23500/541

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017065
シリーズID:	PA00000011
会議名:	Symposium on ferroelectric thin films
回次:	7th
会議開催地:	Boston, MA, USA
会議開催年:	1998.11.30-1998.12.03

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