Rapid Thermal Process Requirements for the Annealling of Ultrashallow Junctions
- 著者名:
Downey, Daniel F. Daryanani, Sonu L. Meloni, Marylou Brown, Kristen M. Felch, Susan B. Lee, Brian S. Marcus, Steven D. Gelpey, Jeff - 掲載資料名:
- Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 470
- 発行年:
- 1997
- 開始ページ:
- 299
- 出版情報:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993747 [1558993746]
- 言語:
- 英語
- 請求記号:
- M23500/470
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Simulation of Rapid Thermal Annealed Boron Ultrashallow Junctions in Inert and Oxidizing Ambient
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Electrochemical Society |
11
国際会議録
Influence of Thermal Nitridation on the Diffusion of Arsenic during Rapid Thermal Annealing
Electrochemical Society |
Electrochemical Society |
Materials Research Society |