Growth and Properties of W-Si-N Diffusion Barriers Deposited by Chemical Vapor Deposition
- 著者名:
- 掲載資料名:
- Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 427
- 発行年:
- 1996
- 開始ページ:
- 389
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993303 [1558993304]
- 言語:
- 英語
- 請求記号:
- M23500/427
- 資料種別:
- 国際会議録
類似資料:
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2
国際会議録
Thermal Metalorganic Chemical Vapor Deposition of Ti-Si-N Films for Diffusion Barrier Applications
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