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Evaluation of Reaction Dynamics of Film Depositions in Plasma CVDs by Using a Remote Plasma CVD System

著者名:
掲載資料名:
Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
406
発行年:
1996
開始ページ:
145
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993099 [1558993096]
言語:
英語
請求記号:
M23500/406
資料種別:
国際会議録

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