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Incorporation of Hydrogen in SiO2 and Si3N4 Thin Films Deposited by ECR-CVD

著者名:
Brown, J.
Boudreau, M.
Boumerzoug, M.
Mascher, P.
Jackman, T. E.
Tong, S. Y.
Haugen, H.
さらに 2 件
掲載資料名:
Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
378
発行年:
1995
開始ページ:
1037
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992818 [1558992812]
言語:
英語
請求記号:
M23500/378
資料種別:
国際会議録

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