Blank Cover Image

Anomalous Diffusion of Phosphorus in Silicon by Pair Diffusion Model and Decrease in Quasi Vacancy Formation Energy

著者名:
Yoshida,M.  
掲載資料名:
Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995
シリーズ名:
Materials science forum
シリーズ巻号:
196-201
発行年:
1995
パート:
4
開始ページ:
1595
終了ページ:
1600
出版情報:
Zurich, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878497164 [0878497161]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

類似資料:

1 国際会議録 A New Model of Anomalous Phosphorus Diffusion in Silicon

Budil,M., Potzl,H., Stingeder,G., Grasserbauer,M., Goser,K.

Trans Tech Publications
7 国際会議録 Formation and Binding Energies of Vacancy Clusters in Silicon

Colombo, L., Bongiorno, A., Rubia, T. Diaz de la

MRS - Materials Research Society
2 国際会議録 Anomalous Diffusion of Ultralow Energy Boron Implants in Silicon

Webb, R. P., Foad, M. A., Gwilliam, R. M., Knights, A. P., Thomas, G.

MRS - Materials Research Society
8 国際会議録 A NEW MODEL OF TAIL DIFFUSION OF PHOSPHORUS AND BORON IN SILICON

Morehead, F.F., Lever, R.F.

Materials Research Society
3 国際会議録 Vacancy-Interstitial Pair-Formation Mechanism of X-ray-Irradiation-Induced Crystallization in Amorphous Silicon Studied by ab initio Molecular Dynamics …

Matsumura, T., Katayama-Yoshida, H., Orita, N.

MRS - Materials Research Society
9 国際会議録 Effect of Chemical Environment and Strain on Oxygen Vacancy Formation Energies at Silicon-Silicon Oxide Interfaces

Henderson, T. M., Greer, J. C., Bersuker, G., Korkin, A., Bartlett, R. J.

Springer
4 国際会議録 MODELING OF PHOSPHORUS DIFFUSION IN SILICON

Dunham, S.T.

Electrochemical Society
10 国際会議録 ENCHANCED DIFFUSION OF PHOSPHORUS AT GRAIN BOUNDARIES IN SILICON

Cheng, L. J., Shyu, C. M., Stika, K. M.

North-Holland
5 国際会議録 AN ANOMALOUS VACANCY DIFFUSION IN SILICON DURING THE ANTIMONY DRIVE-IN DIFFUSION

Wijaranakula, W., Matlock, J.H.

Materials Research Society
11 国際会議録 CHALCOGEN AND VACANCY PAIRS IN SILICON:ELECTRONIC STRUCTURE:AND STABILITIES.

SCHEFFLER,C.M., SCHEFFLER,M.

Trans Tech Publications
6 国際会議録 ANOMALOUS TRANSIENT TAIL DIFFUSION OF BORON IN SILICON: KINETIC MODELING OF DIFFUSION AND CLUSTER FORMATION

Cowern, N.E.B., Jos, H.F.F., Janssen, K.T.F, Wachters, A.J.H.

Materials Research Society
12 国際会議録 THE ROLE OF VACANCIES IN ENHANCING OXYGEN DIFFUSION IN SILICON

Oates A.S., Newman R.C., Tucker J.M., Davies G., Lightowlers E.C.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12