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PL study of QDs manufactured by visible light lithography and wet etching

著者名:
Liu,X. ( Shanghai Institute of Technical Physics (China) )
Wan,M. ( Shanghai Institute of Technical Physics (China) )
Zhang,B. ( Shanghai Institute of Technical Physics (China) )
Chen,X. ( Shanghai Institute of Technical Physics (China) )
Lu,W. ( Shanghai Institute of Technical Physics (China) )
Shen,S.C. ( Shanghai Institute of Technical Physics (China) )
さらに 1 件
掲載資料名:
Third International Conference on Thin Film Physics and Applications : 15-17 April 1997, Shanghai, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3175
発行年:
1998
開始ページ:
412
終了ページ:
414
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426734 [0819426733]
言語:
英語
請求記号:
P63600/3175
資料種別:
国際会議録

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