Cl2 Plasma-Si Surface Interactins in Plasma Etching

Cl2 Plasma-Si Surface Interactins in Plasma Etching

著者名:

Donnelly M. V.

掲載資料名:

Plasma processing of semiconductors

シリーズ名:

NATO ASI series. Series E, Applied sciences

シリーズ巻号:

336

発行年:

1997

開始ページ:

243

終了ページ:

275

総ページ数:

33

出版情報:

Dordrecht: kluwer Academic Publishers

ISSN:

0168132X

ISBN:

9780792345671 [0792345673]

言語:

英語

請求記号:

N11482/336

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016902
シリーズID:	PA00000018
会議名:	NATO Advanced Study Institute on Plasma Processing of Semiconductors
回次:	1996
会議開催地:	Chateau de Bonas, France
会議開催年:	1996.06.17-1996.06.18

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