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Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas

著者名:
Coburn W. J.  
掲載資料名:
Plasma processing of semiconductors
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
336
発行年:
1997
開始ページ:
211
終了ページ:
219
総ページ数:
9
出版情報:
Dordrecht: kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792345671 [0792345673]
言語:
英語
請求記号:
N11482/336
資料種別:
国際会議録

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